Dermo-purifying and rebalancing Clay mask, particularly recommended for impure, shiny, acne-prone skin.
Soft Clay mask with a mattifying action recommended for impure, shiny, acne-prone skin.
The dermo-purifying and sebum-regulating properties of Clay, Zinc and Iris extract combine with the moisturizing ones of Hyaluronic Acid, regenerating of Vitamin A and rebalancing of Alpha Glucan for a deeply clean, supple and bright skin. Dermatologically tested on sensitive skin. Nickel < 0.0001%.
Apply evenly on the face, leave on for 10 minutes and remove with warm water. Recommended frequency of use: once a week.
Aqua/Water, Glycerin, C12-20 Acid Peg-8 Ester, Caprylic/Capric Triglyceride, Propanediol, Solum Fullonum/Fuller’s Earth, Prunus Amygdalus Dulcis (Sweet Almond) Oil, Cetearyl Alcohol, Butyrospermum Parkii (Shea) Butter, Glyceryl Stearate, Titanium Dioxide, Stearic Acid, Phenoxyethanol, Xanthan Gum, Alpha-Glucan Oligosaccharide, Potassium Cetyl Phosphate, Sodium Gluconate, Ethylhexylglycerin, Sodium Polyacrylate, Parfum/Fragrance, Chlorphenesin, Hydrogenated Polydecene, Alcohol, Panthenol, Tocopheryl Acetate, Iris Florentina Root Extract, Trideceth-6, Limonene, Lecithin, Sodium Hyaluronate, Tridecane, Saccharomyces-Copper Ferment, Saccharomyces-Iron Ferment, Saccharomyces-Magnesium Ferment, Saccharomyces-Silicon Ferment, Saccharomyces-Zinc Ferment, Zinc Sulfate, Tocopherol, Hydroxycitronellal, Ascorbyl Palmitate, Leuconostoc/Radish Root Ferment Filtrate, Linalool, Geraniol, Retinyl Palmitate, Citric Acid.
The above-mentioned INCI list may vary slightly from the one on the package due to formula updates. It is advisable to always refer to the INCI present on the packaging of the single product.
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